Contents
Preface xi
1 MOSFET Device Physics and Operation 1
1.1 Introduction 1
1.2 The MOS Capacitor 2
1.2.1 Interface Charge 3
1.2.2 Threshold Voltage 7
1.2.3 MOS Capacitance 8
1.2.4 MOS Charge Control Model 12
1.3 Basic MOSFET Operation 13
1.4 Basic MOSFET Modeling 15
1.4.1 Simple Charge Control Model 16
1.4.2 The Meyer Model 18
1.4.3 Velocity Saturation Model 19
1.4.4 Capacitance Models 21
1.4.5 Comparison of Basic MOSFET Models 25
1.4.6 Basic Small-signal Model 26
1.5 Advanced MOSFET Modeling 27
1.5.1 Modeling Approach 29
1.5.2 Nonideal Effects 31
1.5.3 Unified MOSFET C–V Model 37
References 44
2 MOSFET Fabrication 47
2.1 Introduction 47
2.2 Typical Planar Digital CMOS Process Flow 48
2.3 RF CMOS Technology 60
References 67
3 RF Modeling 69
3.1 Introduction 69
3.2 Equivalent Circuit Representation of MOS Transistors 71
3.3 High-frequency Behavior of MOS Transistors and AC Small-signal
Modeling 78
vi CONTENTS
3.3.1 Requirements for MOSFET Modeling for RF Applications 79
3.3.2 Modeling of the Intrinsic Components 80
3.3.3 HF Behavior and Modeling of the Extrinsic Components 83
3.3.4 Non-quasi-static Behavior 98
3.4 Model Parameter Extraction 101
3.4.1 RF Measurement and De-embedding Techniques 101
3.4.2 Parameter Extraction 106
3.5 NQS Model for RF Applications 113
References 115
4 Noise Modeling 119
4.1 Noise Sources in a MOSFET 119
4.2 Flicker Noise Modeling 119
4.2.1 The Physical Mechanisms of Flicker Noise 120
4.2.2 Flicker Noise Models 122
4.2.3 Future Work in Flicker Noise Modeling 123
4.3 Thermal Noise Modeling 126
4.3.1 Existing Thermal Noise Models 126
4.3.2 HF Noise Parameters 128
4.3.3 Analytical Calculation of the Noise Parameters 132
4.3.4 Simulation and Discussions 134
4.3.5 Induced Gate Noise Issue 138
References 138
5 Proper Modeling for Accurate Distortion Analysis 141
5.1 Introduction 141
5.2 Basic Terminology 142
5.3 Nonlinearities in CMOS Devices and Their Modeling 145
5.4 Calculation of Distortion in Analog CMOS Circuits 149
References 151
6 The BSIM4 MOSFET Model 153
6.1 An Introduction to BSIM4 153
6.2 Gate Dielectric Model 153
6.3 Enhanced Models for Effective DC and AC Channel Length and Width 155
6.4 Threshold Voltage Model 157
6.4.1 Enhanced Model for Nonuniform Lateral Doping due to Pocket
(Halo) Implant 157
6.4.2 Improved Models for Short-channel Effects 159
6.4.3 Model for Narrow Width Effects 161
6.4.4 Complete Threshold Voltage Model in BSIM4 163
6.5 Channel Charge Model 164
6.6 Mobility Model 167
6.7 Source/Drain Resistance Model 169
CONTENTS vii
6.8 I –V Model 172
6.8.1 I–V Model When rdsMod = 0 (RDS(V ) = 0) 172
6.8.2 I–V Model When rdsMod = 1 (RDS(V ) = 0) 175
6.9 Gate Tunneling Current Model 176
6.9.1 Gate-to-substrate Tunneling Current IGB 176
6.9.2 Gate-to-channel and Gate-to-S/D Currents 178
6.10 Substrate Current Models 179
6.10.1 Model for Substrate Current due to Impact Ionization
of Channel Current 179
6.10.2 Models for Gate-induced Drain Leakage (GIDL) and
Gate-induced Source Leakage (GISL) Currents 180
6.11 Capacitance Models 180
6.11.1 Intrinsic Capacitance Models 181
6.11.2 Fringing/Overlap Capacitance Models 188
6.12 High-speed (Non-quasi-static) Model 190
6.12.1 The Transient NQS Model 190
6.12.2 The AC NQS Model 192
6.13 RF Model 192
6.13.1 Gate Electrode and Intrinsic-input Resistance (IIR) Model 192
6.13.2 Substrate Resistance Network 194
6.14 Noise Model 194
6.14.1 Flicker Noise Models 195
6.14.2 Channel Thermal Noise Model 196
6.14.3 Other Noise Models 197
6.15 Junction Diode Models 198
6.15.1 Junction Diode I–V Model 198
6.15.2 Junction Diode Capacitance Model 200
6.16 Layout-dependent Parasitics Model 201
6.16.1 Effective Junction Perimeter and Area 201
6.16.2 Source/drain Diffusion Resistance Calculation 204
References 206
7 The EKV Model 209
7.1 Introduction 209
7.2 Model Features 209
7.3 Long-channel Drain Current Model 210
7.4 Modeling Second-order Effects of the Drain Current 212
7.4.1 Velocity Saturation and Channel-length Modulation 212
7.4.2 Mobility Degradation due to Vertical Electric Field 213
7.4.3 Effects of Charge-sharing 213
7.4.4 Reverse Short-channel Effect (RSCE) 214
7.5 SPICE Example: The Effect of Charge-sharing 214
7.6 Modeling of Charge Storage Effects 216
7.7 Non-quasi-static Modeling 218
viii CONTENTS
7.8 The Noise Model 219
7.9 Temperature Effects 219
7.10 Version 3.0 of the EKV Model 220
References 220
8 Other MOSFET Models 223
8.1 Introduction 223
8.2 MOS Model 9 223
8.2.1 The Drain Current Model 224
8.2.2 Temperature and Geometry Dependencies 227
8.2.3 The Intrinsic Charge Storage Model 231
8.2.4 The Noise Model 233
8.3 The MOSA1 Model 235
8.3.1 The Unified Charge Control Model 235
8.3.2 Unified MOSFET I –V Model 237
8.3.3 Unified C–V Model 241
References 241
9 Bipolar Transistors in CMOS Technologies 243
9.1 Introduction 243
9.2 Device Structure 243
9.3 Modeling the Parasitic BJT 243
9.3.1 The Ideal Diode Equation 245
9.3.2 Nonideal Effects 246
References 247
10 Modeling of Passive Devices 249
10.1 Introduction 249
10.2 Resistors 249
10.2.1 Well Resistors 251
10.2.2 Metal Resistors 252
10.2.3 Diffused Resistors 252
10.2.4 Poly Resistors 253
10.3 Capacitors 254
10.3.1 Poly–poly Capacitors 255
10.3.2 Metal–insulator–metal Capacitors 256
10.3.3 MOSFET Capacitors 257
10.3.4 Junction Capacitors 258
10.4 Inductors 260
References 262
11 Effects and Modeling of Process Variation and Device Mismatch 263
11.1 Introduction 263
11.2 The Influence of Process Variation and Device Mismatch 264
11.2.1 The Influence of LPVM on Resistors 264
11.2.2 The Influence of LPVM on Capacitors 266
11.2.3 The Influence of LPVM on MOS Transistors 269
CONTENTS ix
11.3 Modeling of Device Mismatch for Analog/RF Applications 271
11.3.1 Modeling of Mismatching of Resistors 271
11.3.2 Mismatching Model of Capacitors 271
11.3.3 Mismatching Models of MOSFETs 273
References 277
12 Quality Assurance of MOSFET Models 279
12.1 Introduction 279
12.2 Motivation 279
12.3 Benchmark Circuits 281
12.3.1 Leakage Currents 282
12.3.2 Transfer Characteristics in Weak and Moderate Inversion 283
12.3.3 Gate Leakage Current 284
12.4 Automation of the Tests 285
References 286
Index 287
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